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Patent Details

Indian Institute of Technology (IIT) Roorkee 
A device for pressurized multiphase flow during electrochemical discharge machining process 
Akshay Dvivedi, Rajendra Kumar 
Indian Institute of Technology (IIT) Roorkee 
Application type:
Applied - 2019-05-01 
Application Number:
Applied at:
Entered by:
Indian Institute of Technology (IIT) Roorkee 
Thus according to the basic aspect of present invention there is provided a device for pressurized multiphase flow (PMF) during electrochemical discharge 20 machining (ECDM) process. The said device comprises of 3-way tubing connected to a digital infusion pump and a pressurized gas bottle as inlet and a tubular tool electrode as an outlet. The pressurized multiphase flow (PMF) device provides intermittent flow of 25 working electrolyte and gas through tubular micro tool electrode into the machining zone during drilling of micro holes using ECDM process on difficult to machine material like glass, ceramic and MMCs. Thereof, the use of this novel device for ECDM process referred as pressurized multiphase flow assisted ECDM (PMF-ECDM) process. Also, the said device can be used to provide more than 30 two phase such as solid micro particles, liquid and gas into the machining zone sequentially and simultaneously. The said device can also be adopted for other unconventional micro machining process like micro-EDM and micro-ECM apart from ECDM to provide multi-phase flow into the machining zone. The device can be used to inject multi-phase flow inside the machining zone during ECDM process, accordingly deep micro feature can be fabricated on the work material (particularly on hard and brittle non-conductive materials like glass and ceramic). 

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