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Equipment Info
RF DC Magnetron Sputtering
Equipment Code : 044780
Make : VR Technology
Model : RF/DC
Institution : Gandhi Institute of Technology and Management (GITAM) (Deemed to be University)Visakhapatnam
Department : Central Research Laboratory
Funding Agency Details :
Pooling of Equipment slot : No
Last AMC Done :
Description : Sputtering works by ejecting material from a target to a substrate through plasma generated by inert gas. The process occurs at extremely low temperatures, and the concentration of the deposited film is similar to the raw material.The particles that are ejected build up on any surface they land on, creating a thin film of the target material. Sputtering is a process that deposits thin films of materials across a range of industries, including microelectronics, optics, and coatings. It's important because it's a key part of modern materials science and technological advancements. Semiconductor industry Sputtering is used to deposit thin films of various materials on silicon wafers for integrated circuit processing. This process is crucial for ensuring chip performance and stability by depositing contact metals, barrier layers, and conductive components
| S.No. | Users Category | Rate (unit ) & (In Rupees) |
|---|---|---|
| 1 | Academic (External)* | 0.00 |
| 2 | Academic (Internal)*** | 0.00 |
| 3 | Industry User | 0.00 |
| 4 | National Research Lab User | 0.00 |
| 5 | Start-ups Company | 0.00 |
Note:
i) Academic (External) means researchers belongs to the other institution.
ii) Academic (Internal but different department/lab) means researchers belongs to other department/lab or other investigators.
iii) Academic (Internal) means researchers belongs to the same institution.
| Sample Name | Sample Type | Sample UOM | Sample Availability | Unit Cost | Sample Quantity | Sample Description |
|---|---|---|---|---|---|---|
| No Data Available | ||||||
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