Equipment Info

RF DC Magnetron Sputtering

Equipment Code : 044780

Make : VR Technology

Model : RF/DC

Institution : Gandhi Institute of Technology and Management (GITAM) (Deemed to be University)Visakhapatnam

Department : Central Research Laboratory

Funding Agency Details :

Pooling of Equipment slot :   No

Last AMC Done :  

Reference Website :

Description : Sputtering works by ejecting material from a target to a substrate through plasma generated by inert gas. The process occurs at extremely low temperatures, and the concentration of the deposited film is similar to the raw material.The particles that are ejected build up on any surface they land on, creating a thin film of the target material. Sputtering is a process that deposits thin films of materials across a range of industries, including microelectronics, optics, and coatings. It's important because it's a key part of modern materials science and technological advancements. Semiconductor industry Sputtering is used to deposit thin films of various materials on silicon wafers for integrated circuit processing. This process is crucial for ensuring chip performance and stability by depositing contact metals, barrier layers, and conductive components

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