Equipment Info

RIE PLASMA ETCHER STRIPPER

Equipment Info

Equipment Code : 1947223

Make : ADNANOTEK CORPORATION

Model : RIES4

Institution : Indian Institute of Technology (IIT) Kharagpur

Department :

Funding Agency Details : MeitY, Govt. of India

Pooling of Equipment slot :   No

AMC End Date (Valid Till) :  

PRISM Service Category (About PRISM) : D

Pre-Experiment Support (including sample preparation, setup assistance and pre-experimental guidance) :

Post-Experiment Support (including result interpretation, data analysis and post-experimental reporting) :

Equipment Certification (if any) (No document available):

Equipment Calibration (if any) (No document available):

Remarks / Special Instructions (if any):

Description : The AD-NANOTEK RIE-S4 is a Reactive Ion Etching (RIE) system designed for precise anisotropic etching of various materials used in micro- and nano-fabrication processes. It utilizes a combination of chemically reactive plasma and physical ion bombardment to achieve high-resolution pattern transfer with excellent control over etch profiles. Key Features: Etch Capabilities: Suitable for materials such as silicon, silicon dioxide, silicon nitride, and various metals. Plasma Source: Typically employs RF-powered plasma generation for uniform etching. Process Control: Equipped with parameters to control gas flow rates, chamber pressure, RF power, and etching time. Substrate Compatibility: Accommodates standard wafer sizes, commonly up to 6 inches. Safety Features: Includes interlocks and monitoring systems to ensure safe operation.

Usage Rate: (as indicated by the custodian/host institution)

S.No. Users Category Rate (unit ) & (In Rupees)
1 Academic (External)*
2 Academic (Internal)***
3 Grassroot innovator
4 Industry User
5 National Research Lab User
6 Startup/MSME User


Accessories / Consumables / Spare parts / Testing modes

Sample Name Sample Type Sample UOM Sample Availability Unit Cost Sample Quantity Sample Description
No Data Available