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Equipment Info
Reactive Ion etching System
Equipment Code : 2747280
Make : Sentech
Model : SI500
Institution : Indian Institute of Technology (IIT) Bombay
Department : Centre for Sophisticated Instruments and Facilities
Funding Agency Details :
Pooling of Equipment slot : No
Last AMC Done :
Reference Website : https://instruments.iitb.ac.in/reactive-ion-etching-system
Description : The ICP-RIE (Inductively Coupled Plasma Reactive Ion Etching) system is a highly advanced tool used for dry etching in the fabrication of micro- and nanostructures. It provides high precision, high anisotropy, and high selectivity in etching processes.The system can achieve highly anisotropic etching (vertical sidewalls) and high etching selectivity between different materials
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Note:
i) Academic (External) means researchers belongs to the other institution.
ii) Academic (Internal but different department/lab) means researchers belongs to other department/lab or other investigators.
iii) Academic (Internal) means researchers belongs to the same institution.
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