Equipment Info

Inductively Coupled Plasma Reactive Ion Etching

Equipment Info

Equipment Code : 548410

Make : Sentech

Model : SI500

Institution : Indian Institute of Technology (IIT) Roorkee

Department : Department of Physics

Funding Agency Details : DST, Govt. of India

Pooling of Equipment slot :   Yes

AMC End Date (Valid Till) :  

PRISM Service Category (About PRISM) : D

Pre-Experiment Support (including sample preparation, setup assistance and pre-experimental guidance) :

Post-Experiment Support (including result interpretation, data analysis and post-experimental reporting) :

Equipment Certification (if any) (No document available):

Equipment Calibration (if any) (No document available):

Remarks / Special Instructions (if any):

Description : The SENTECH SI 500 ICP-RIE is a high-end plasma etch system that utilizes an ICP source with low ion energy for low-damage etching and precise nanostructuring. It features a compact vacuum load lock, supports wafers up to 200?mm, and offers a substrate temperature range from –20?°C to 250?°C. Available Gases: N2, He, O2, CF4, SF6, CHF3, Ar, CH4, H2, and C4F8.

Usage Rate: (as indicated by the custodian/host institution)


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Per hour charges

Accessories / Consumables / Spare parts / Testing modes

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