Equipment Info

Reactive ion Etching

Equipment Info

Equipment Code : 2059489

Make : Hind High Vacuum Co.Pvt.Ltd.

Model : RIE UNIT

Institution : Indian Institute of Technology (Indian School of Mines) Dhanbad

Department : Central Research Facility

Funding Agency Details : Institution

Pooling of Equipment slot :   No

AMC End Date (Valid Till) :  

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PRISM Service Category (About PRISM) : D

Pre-Experiment Support (including sample preparation, setup assistance and pre-experimental guidance) :

Post-Experiment Support (including result interpretation, data analysis and post-experimental reporting) :

Equipment Certification (if any) (No document available):

Equipment Calibration (if any) (No document available):

Remarks / Special Instructions (if any):

Description : Manufacturer: Hind High Vacuum Co. Pvt. Ltd., Bangalore, India Model & Part Number: RIE Unit (Part No. 5313-000-000) System Type: Dual Chamber PVD System Serial Number: D1238 Power Requirements:Rated Voltage: 415V AC Phase: 3 Phase, 50 Hz Current: 25 AMP The Dual Chamber PVD System (RIE Unit) is used for high-precision dry etching and thin-film deposition to analyze material removal rates and surface morphology. It enables the fabrication and characterization of micro-nanostructures, semiconductor devices, and multilayer optical coatings under controlled vacuum conditions.

Usage Rate: (as indicated by the custodian/host institution)


Samples External Academic User Internal Academic User Industry User Start-ups National Research Lab User Grassroot innovator
RIE (OXYGEN/ HYDROGEN/ ARGON/ SF6/ CF4 PLASMA of 5 minutes duration)

Accessories / Consumables / Spare parts / Testing modes

Sample Name Sample Type Sample UOM Sample Availability Unit Cost Sample Quantity Sample Description
No Data Available